Metal/semiconductor and transparent conductive oxide (TCO)/semiconductor heterojunctions have emerged as an effective\nmodality in the fabrication of photoelectric devices. This review is following a recent shift toward the engineering of TCOlayers and\nstructured Si substrates, incorporating metal nanoparticles for the development of next-generation photoelectric devices. Beneficial\nprogress which helps to increase the efficiency and reduce the cost, has been sequenced based on efficient technologies involved in\nmaking novel substrates, TCOlayers, and electrodes. Theelectrical and optical properties of indium tin oxide (ITO) and aluminum\ndoped zinc oxide (AZO) thin films can be enhanced by structuring the surface of TCO layers. The TCO layers embedded with\nAg nanoparticles are used to enhance the plasmonic light trapping effect in order to increase the energy harvesting nature of\nphotoelectric devices. Si nanopillar structures which are fabricated by photo lithography-free technique are used to increase lightactive\nsurface region.The importance of the structure and area of front electrodes and the effect of temperature at the junction are\nthe value added discussions in this review.
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